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Resonant optical nano-antennas
The scope of this project is to adapt a fabrication process for optical antennas to transparent substrates and study plasmon-plasmon interactions in these fabricated structures.
Optical antennas can localize and concentrate light into tiniest volumes well below the diffraction limit that enable several promising novel applications such as e.g. single-molecule Raman spectroscopy. Antennas tailored for the visible range are typically only few tens of nanometers in size and their metallic composition supports surface plasmons polaritons. Achieving a resonant condition with the incident light depends on the inter-particle distance, the illumination and the antenna geometry. High field enhancements are consequently achieved for gaps in the sub-5 nm range, rendering big challenges in top-down fabrication.
The scope of this project is to adapt a fabrication process for optical antennas to transparent substrates and study plasmon-plasmon interactions in these fabricated structures. Starting point is a process which has already been demonstrated to produce 5 nm gaps on silicon wafer. It is based on cutting-edge nano-fabrication technologies (electron beam lithography) and multiple characterization metrologies (scanning and transmission electron microscopy) will be performed in the joint ETHZ-IBM Binnig and Rohrer Nanotechnology Center in Rüschlikon. Further optical characterization through a supercontinuum spectroscopic method will give insight into radiant and sub-radiant modes of the plamonic structures.
Optical antennas can localize and concentrate light into tiniest volumes well below the diffraction limit that enable several promising novel applications such as e.g. single-molecule Raman spectroscopy. Antennas tailored for the visible range are typically only few tens of nanometers in size and their metallic composition supports surface plasmons polaritons. Achieving a resonant condition with the incident light depends on the inter-particle distance, the illumination and the antenna geometry. High field enhancements are consequently achieved for gaps in the sub-5 nm range, rendering big challenges in top-down fabrication.
The scope of this project is to adapt a fabrication process for optical antennas to transparent substrates and study plasmon-plasmon interactions in these fabricated structures. Starting point is a process which has already been demonstrated to produce 5 nm gaps on silicon wafer. It is based on cutting-edge nano-fabrication technologies (electron beam lithography) and multiple characterization metrologies (scanning and transmission electron microscopy) will be performed in the joint ETHZ-IBM Binnig and Rohrer Nanotechnology Center in Rüschlikon. Further optical characterization through a supercontinuum spectroscopic method will give insight into radiant and sub-radiant modes of the plamonic structures.
Not specified
Prof. Dr. Lukas Novotny lnovotny@ethz.ch
Dr. Emanuel Lörtscher eml@zurich.ibm.com
Prof. Dr. Lukas Novotny lnovotny@ethz.ch Dr. Emanuel Lörtscher eml@zurich.ibm.com