Development of a fabrication method for X-ray gratings with sub-micron features

The team headed by Prof. Stampanoni develops advanced imaging techniques at the synchrotron (SLS) and strives at the translation to medical devices in a multidisciplinary effort involving academia, industry and medical partners. Our micro-fabrication team produces X-ray optical components for different projects. We recently patented a new etching method of silicon substrates allowing to surpass the aspect ratio limit of conventional silicon etching used in chip-manufacturing technology by several orders of magnitude (see our publication about MacEtch). MacEtch is a very active field of research, from both fundamental and applications perspectives, it can achieve extreme aspect ratio in the order of 10’000:1 against the 100:1 of the industry standard of deep reactive ion etching by using the catalytic properties of a metal pattern. We are now targeting to engineer the catalyst properties by ad hoc design of its geometry and interfaces in order to improve the defects control during the etching and to achieve the high quality required for X-ray gratings. The Paul Scherrer Institute PSI is the largest research institute for natural and engineering sciences within Switzerland. We perform cutting-edge research in the fields of matter and materials, energy and environment and human health. By performing fundamental and applied research, we work on sustainable solutions for major challenges facing society, science and economy. PSI is committed to the training of future generations.

The team headed by Prof. Stampanoni develops advanced imaging techniques at the synchrotron (SLS) and strives at the translation to medical devices in a multidisciplinary effort involving academia, industry and medical partners. Our micro-fabrication team produces X-ray optical components for different projects. We recently patented a new etching method of silicon substrates allowing to surpass the aspect ratio limit of conventional silicon etching used in chip-manufacturing technology by several orders of magnitude (see our publication about MacEtch). MacEtch is a very active field of research, from both fundamental and applications perspectives, it can achieve extreme aspect ratio in the order of 10’000:1 against the 100:1 of the industry standard of deep reactive ion etching by using the catalytic properties of a metal pattern. We are now targeting to engineer the catalyst properties by ad hoc design of its geometry and interfaces in order to improve the defects control during the etching and to achieve the high quality required for X-ray gratings.
The Paul Scherrer Institute PSI is the largest research institute for natural and engineering sciences within Switzerland. We perform cutting-edge research in the fields of matter and materials, energy and environment and human health. By performing fundamental and applied research, we work on sustainable solutions for major challenges facing society, science and economy. PSI is committed to the training of future generations.

You will refine and further develop our novel catalyst patterning method in the sub-micrometer range using special lithographic tools. Your work will be used in our group at synchrotron and our laboratories to diffract X-rays. For this you will interact with the fabrication team to familiarize yourself about an X-ray grating and its fabrication protocol in a clean room facility. PSI has a brand-new cutting-edge clean room facility with unique capabilities in lithography. You will have the opportunity to be trained by microfabrication experts and practice by yourself in this exceptional environment. You will be asked to learn the concepts of our Displacement Talbot lithography method and the principles of MacEtch to support the experimental efforts in developing a patterning protocol suitable for MacEtch processing at wafer scale. You will be supported and supervised in your daily work by a PhD student working on MacEtch and you will be integrated in a team of micro-fabrication scientists with different expertise spanning from lithography to plasma etching and wet chemistry. You will directly experience all the steps of pattern preparation, from theory to practice, metal deposition and characterization via advanced optical microscopy and scanning electron microscopy. You will assist in etching experiments and their characterization. The lab training opens the opportunity for an advanced project at PhD level.

You will refine and further develop our novel catalyst patterning method in the sub-micrometer range using special lithographic tools. Your work will be used in our group at synchrotron and our laboratories to diffract X-rays. For this you will interact with the fabrication team to familiarize yourself about an X-ray grating and its fabrication protocol in a clean room facility. PSI has a brand-new cutting-edge clean room facility with unique capabilities in lithography. You will have the opportunity to be trained by microfabrication experts and practice by yourself in this exceptional environment. You will be asked to learn the concepts of our Displacement Talbot lithography method and the principles of MacEtch to support the experimental efforts in developing a patterning protocol suitable for MacEtch processing at wafer scale.
You will be supported and supervised in your daily work by a PhD student working on MacEtch and you will be integrated in a team of micro-fabrication scientists with different expertise spanning from lithography to plasma etching and wet chemistry.
You will directly experience all the steps of pattern preparation, from theory to practice, metal deposition and characterization via advanced optical microscopy and scanning electron microscopy. You will assist in etching experiments and their characterization. The lab training opens the opportunity for an advanced project at PhD level.

Please write directly to the PhD student Bryan Benz: bryan.benz@psi.ch

Please write directly to the PhD student
Bryan Benz: bryan.benz@psi.ch